Effect of reticle bias on isofocal process performance at subhalfmicron resolution

Brian Martin; Graham G. Arthur

doi:10.1117/12.275909

7 July 1997 Effect of reticle bias on isofocal process performance at sub-half-micron resolution

Brian Martin, Graham G. Arthur

Proceedings Volume 3050, Metrology, Inspection, and Process Control for Microlithography XI; (1997) https://doi.org/10.1117/12.275909
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

This paper investigates, by computer simulation, the effect of reticle bias on the isofocal behavior displayed by a range of feature types down to 0.4 micron resolution. All simulations are in the developed resist image and exploit resist and development parameters of a contemporary i-line positive resist. Results show that, with the exception of isolated lines, the application of reticle bias is ineffective in achieving a corresponding shift in the isofocal dimension.

Citation Download Citation

Brian Martin and Graham G. Arthur "Effect of reticle bias on isofocal process performance at sub-half-micron resolution", Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); https://doi.org/10.1117/12.275909

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