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7 July 1997 Plasma antireflective coating optimization using enhanced reflectivity modeling
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Abstract
An improved method is presented for the optimization of plasma deposited bottom inorganic anti-reflective coatings (ARCs). These ARCs have shown the capability to improve photolithography profess margins through reduction of substrate reflectivity while meeting integration issues. However, the ability to vary plasma ARC optical properties through deposition conditions has led to increased complexity of film stack optimization. We present simple but effective enhanced modeling methods for reducing the effort required to properly tune plasma ARC optical conditions and optimize complex films tacks incorporating these materials.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin D. Lucas, Jamie A. Vasquez, Ajay Jain, Stanley M. Filipiak, Tam Vuong, Charles Fredrick King, and Bernard J. Roman "Plasma antireflective coating optimization using enhanced reflectivity modeling", Proc. SPIE 3050, Metrology, Inspection, and Process Control for Microlithography XI, (7 July 1997); https://doi.org/10.1117/12.275918
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