Performance of excimer lasers as light sources for 193-nm lithography

Jan H. C. Sedlacek; Scott P. Doran; Michael Fritze; Roderick R. Kunz; Mordechai Rothschild; Ray S. Uttaro; Daniel A. Corliss

doi:10.1117/12.276008

7 July 1997 Performance of excimer lasers as light sources for 193-nm lithography

Jan H. C. Sedlacek, Scott P. Doran, Michael Fritze, Roderick R. Kunz, Mordechai Rothschild, Ray S. Uttaro, Daniel A. Corliss

Author Affiliations +

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276008
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

The performance of argon fluoride excimer lasers is an important issue in determining the practical feasibility of 193-nm exposure systems. This paper presents a summary of the experience gained at MIT Lincoln Laboratory regarding the long-term performance of 193-nm lasers, used under conditions similar to those expected in production-type lithographic systems.

Citation Download Citation

Jan H. C. Sedlacek, Scott P. Doran, Michael Fritze, Roderick R. Kunz, Mordechai Rothschild, Ray S. Uttaro, and Daniel A. Corliss "Performance of excimer lasers as light sources for 193-nm lithography", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276008

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available