CONFERENCE PROCEEDINGS
Advanced Search
Home > Proceedings > Volume 3051 > Article
Paper
7 July 1997 Performance of small-field 193-nm exposure system
Dohoon Kim, Kag Hyeon Lee, Jong-Soo Kim, Sang-Soo Choi, Hye-Keun Oh, Hai Bin Chung, Hyung Joun Yoo
Author Affiliations +
Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276048
Event: Microlithography '97, 1997, Santa Clara, CA, United States
Abstract
A small field ArF excimer laser based exposure tool has been designed and fabricated for the 193 nm lithography process research and exposure tool development. The projection optics based upon Schwartzchild concept has a specification of 3 mm field diameter, X5 reduction ratio, and 0.5 NA. The exposure tool uses an unnarrowed ArF excimer laser as a light source, and uses a fly's eye homogenizer to produce a reticle illumination uniformity of < +/- 5% RMS/pulse. The results of preliminary exposure with PMMA resist coincided with simulation and expectation, and advanced imaging tests carrying out for various resists. In this paper, we report the detailed system parameters and characterization data of the small field ArF excimer laser exposure tool and some of advances in 193 nm lithography that have been achieved with the system.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation Download Citation
Dohoon Kim, Kag Hyeon Lee, Jong-Soo Kim, Sang-Soo Choi, Hye-Keun Oh, Hai Bin Chung, and Hyung Joun Yoo "Performance of small-field 193-nm exposure system", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276048
ACCESS THE FULL ARTICLE
ORGANIZATIONAL
Sign in with credentials provided by your organization.
INSTITUTIONAL
Select your institution to access the SPIE Digital Library.
SELECT YOUR INSTITUTION
PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
PERSONAL SIGN IN
No SPIE Account? Create one
PURCHASE THIS CONTENT
SUBSCRIBE TO DIGITAL LIBRARY
50 downloads per 1-year subscription
Members: $195
Non-members: $335 ADD TO CART
25 downloads per 1 - year subscription
Members: $145
Non-members: $250 ADD TO CART
PURCHASE SINGLE ARTICLE
Includes PDF, HTML & Video, when available
Members: $17.00
Non-members: $21.00 ADD TO CART
PROCEEDINGS
 11 PAGES
DOWNLOAD PAPER SAVE TO MY LIBRARY
GET CITATION
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Excimer lasers
Lithography
Eye
Light sources
Polymethylmethacrylate
Projection systems
Reticles
RELATED CONTENT
Subscribe to Digital Library
Receive Erratum Email Alert
Back to Top