Phase-shift focus monitor applications to lithography tool control

Donald C. Wheeler; Eric P. Solecky; T. Dinh; Rebecca D. Mih

doi:10.1117/12.275968

7 July 1997 Phase-shift focus monitor applications to lithography tool control

Donald C. Wheeler, Eric P. Solecky, T. Dinh, Rebecca D. Mih

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.275968
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Through the use of phase shift techniques, focus errors have been demonstrated to result in easily measurable overlay shifts in printed resist patterns. Using box-in-box with phase shifter design, patterns are printed on wafers and measured on standard overlay equipment. Results are compared to more conventional methods of focus detection. Details include measurement and calibration methodology, focus, and focus tilt results. Additionally, SPC in IBM's ASTC Fab is demonstrated with the Phase Shift Focus Monitor.

Citation Download Citation

Donald C. Wheeler, Eric P. Solecky, T. Dinh, and Rebecca D. Mih "Phase-shift focus monitor applications to lithography tool control", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.275968

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