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7 July 1997 Practical 3D lithography simulation system
Hirotomo Inui, Hirokatsu Kaneko, Keiichiro Tounai, Kiroyoshi Tanabe, Toshiyuki Ohta
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Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276031
Event: Microlithography '97, 1997, Santa Clara, CA, United States
Abstract
We have developed a 3D practical lithography simulation system and realized the practical parameter optimization. A very fast 3D profile computation is performed by using the FFT algorithm in aerial images and the post exposure bake. The optimization system is developed by using object- oriented technology in order to reduce the computation time. The resulted computational time is less than one tenth of the conventional system. The total parameter optimization time is also reduced.
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Hirotomo Inui, Hirokatsu Kaneko, Keiichiro Tounai, Kiroyoshi Tanabe, and Toshiyuki Ohta "Practical 3D lithography simulation system", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276031
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Cited by 2 scholarly publications.
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KEYWORDS
Lithography
Computing systems
3D image processing
Optimization (mathematics)
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