Recent developments in industrial excimer laser technology

Uwe Stamm; Rainer Paetzel; Igor Bragin; Juergen Kleinschmidt; Frank Voss; Dirk Basting

doi:10.1117/12.270114

4 April 1997 Recent developments of industrial excimer laser technology

Uwe Stamm, Rainer Paetzel, Igor Bragin, Juergen Kleinschmidt, Frank Voss, Dirk Basting

Proceedings Volume 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1997) https://doi.org/10.1117/12.270114
Event: XI International Symposium on Gas Flow and Chemical Lasers and High Power Laser Conference, 1996, Edinburgh, United Kingdom

Abstract

The paper reviews recent developments in high power excimer laser technology driven by industrial requirements. Technological achievements as NovaTube^TM laser tube technology and HaloSafe^TM halogen generator technology are discussed. Experimental results are presented for various lasers at the most important excimer wavelengths 351 nm (XeF), 308 nm (XeCl), 248 nm (KrF), 193 nm (ArF) and 157 nm (F₂) which have been designed for application in micromachining, thin-film-transistor annealing, marking as well as lithography.

Citation Download Citation

Uwe Stamm, Rainer Paetzel, Igor Bragin, Juergen Kleinschmidt, Frank Voss, and Dirk Basting "Recent developments of industrial excimer laser technology", Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); https://doi.org/10.1117/12.270114

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