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4 April 1997 Recent developments of industrial excimer laser technology
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Proceedings Volume 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1997) https://doi.org/10.1117/12.270114
Event: XI International Symposium on Gas Flow and Chemical Lasers and High Power Laser Conference, 1996, Edinburgh, United Kingdom
Abstract
The paper reviews recent developments in high power excimer laser technology driven by industrial requirements. Technological achievements as NovaTubeTM laser tube technology and HaloSafeTM halogen generator technology are discussed. Experimental results are presented for various lasers at the most important excimer wavelengths 351 nm (XeF), 308 nm (XeCl), 248 nm (KrF), 193 nm (ArF) and 157 nm (F2) which have been designed for application in micromachining, thin-film-transistor annealing, marking as well as lithography.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Uwe Stamm, Rainer Paetzel, Igor Bragin, Juergen Kleinschmidt, Frank Voss, and Dirk Basting "Recent developments of industrial excimer laser technology", Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); https://doi.org/10.1117/12.270114
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