UV-laser modifications and etching of thin polymer films in different environments

Nikita M. Bityurin; Sergey V. Muraviov; Alexander P. Alexandrov; N. G. Bronnikova; Aleksey Yu. Malyshev

doi:10.1117/12.271664

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4 April 1997 UV-laser modifications and etching of thin polymer films in different environments

Nikita M. Bityurin, Sergey V. Muraviov, Alexander P. Alexandrov, N. G. Bronnikova, Aleksey Yu. Malyshev

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Proceedings Volume 3093, Nonresonant Laser-Matter Interaction (NLMI-9); (1997) https://doi.org/10.1117/12.271664
Event: Nonresonant Laser-Matter Interaction, 1996, St. Petersburg, Russian Federation

Abstract

The role of environment in modification and etching of polymethylmethacrylate (PMMA) films by the fifth harmonic of Nd laser is investigated experimentally. The theoretical model is developed, which describes the main features of modification and etching kinetics for sufficiently small laser fluences.

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Nikita M. Bityurin, Sergey V. Muraviov, Alexander P. Alexandrov, N. G. Bronnikova, and Aleksey Yu. Malyshev "UV-laser modifications and etching of thin polymer films in different environments", Proc. SPIE 3093, Nonresonant Laser-Matter Interaction (NLMI-9), (4 April 1997); https://doi.org/10.1117/12.271664

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