Ellipsometry for determining the refractive index profiles of thin films

Vladimir A. Tolmachev

doi:10.1117/12.271827

1 April 1997 Ellipsometry for determining the refractive index profiles of thin films

Vladimir A. Tolmachev

Proceedings Volume 3094, Polarimetry and Ellipsometry; (1997) https://doi.org/10.1117/12.271827
Event: Polarimetry and Ellipsometry, 1996, Kazimierz Dolny, Poland

Abstract

The results of using the inhomogeneous models as well as technique for their error determining are demonstrated. An inhomogeneous profile error was presented as set of 'error profiles'. The homogeneous, linear and exponential models of profiles of N and K were used for searching. Initial colloid SiO₂ film, after its heating and exposition in air as well as after reactivating was studied. The layers with decreasing PbO component were found on surface of PbO-SiO₂ glass. Graded N and K profiles of In₂O₃-SnO₂ film, used as transparent conducting electrode, were determined by multiangle ellipsometry at wavelength of 632.8 nm.

Citation Download Citation

Vladimir A. Tolmachev "Ellipsometry for determining the refractive index profiles of thin films", Proc. SPIE 3094, Polarimetry and Ellipsometry, (1 April 1997); https://doi.org/10.1117/12.271827

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