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28 July 1997 0.35-μm i-line attenuated phase-shift mask (PSM) repair by focused-ion-beam technology
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Abstract
This paper addresses the capabilities of the Micrion 8000 FIB (focused ion beam) phase shift mask repair tool to repair clear defects and opaque defects found on chrome-based binary and attenuated phase shift masks, and MoSi-based attenuated phase shift masks for 0.35 micrometer lithography. For a repair to be successful, the repair must: match size, shape, and position of the defect, reproduce the desired transmission, minimize damage to the underlying substrate, minimize damage to surrounding non-defect areas, and finally, the repair must be durable. For the production environment, a repair tool must be very reliable and easy to use as well. The Micrion 8000 FIB phase shift mask repair tool incorporates the above requirements.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mark L. Raphaelian, M. F. Ellis, David C. Ferranti, and Diane K. Stewart "0.35-μm i-line attenuated phase-shift mask (PSM) repair by focused-ion-beam technology", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277283
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