Characterization of an advanced performance reticle defect inspection algorithm

James N. Wiley; Christopher M. Aquino; Douglas V. Burnham; Anthony Vacca

doi:10.1117/12.277285

28 July 1997 Characterization of an advanced performance reticle defect inspection algorithm

James N. Wiley, Christopher M. Aquino, Douglas V. Burnham, Anthony Vacca

Proceedings Volume 3096, Photomask and X-Ray Mask Technology IV; (1997) https://doi.org/10.1117/12.277285
Event: Photomask Japan '97, 1997, Kawasaki City, Japan

Abstract

KLA-Tencor has developed a new reticle defect inspection algorithm, APA (advanced performance algorithm), which replaces the current 300 series algorithm (P183), and offers significant improvements in the detection of important defect types on advanced reticles, including OPC reticles. The improvements with APA can also allow inspections with larger pixel sizes compared with P183, resulting in faster inspection times. A suite of test masks was used for evaluating APA's performance on a 351 reticle inspection system at 488 nm using 0.5, 0.375 and 0.25 micrometer pixel sizes. The test suite included a VeriThoro^TM 890EX test reticle and a SEMI- standard programmed defect test pattern scaled by 50%, 33%, 25%, and 20% (producing nominal primary features sizes of 1.5, 1.0, 0.75 and 0.60 micrometer). APA's improved performance allowed the use of the 0.375 micrometer pixel size for the 1.5 and 1.0 micrometer linewidth patterns resulting in faster inspection times (compared with the 0.25 micrometer pixel size for P183); it further allowed the successful inspection of the 0.75 and 0.60 micrometer linewidth patterns. A methodology was developed to analyze, summarize and compare the performance results of APA and P183. Finally, APA successfully inspected various actual product reticles with patterns of 0.75 micrometer and below including an advanced MicroUnity OPC (optical proximity correction) reticle with 0.75 micrometer serif and 0.35 micrometer database neck dimensions.

Citation Download Citation

James N. Wiley, Christopher M. Aquino, Douglas V. Burnham, and Anthony Vacca "Characterization of an advanced performance reticle defect inspection algorithm", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277285

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
17 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Inspection

Reticles

Optical proximity correction

Photomasks

Algorithm development

Detection and tracking algorithms

Defect inspection

Show All Keywords

Keywords/Phrases

Search In:

Publication Years