Development of an in-situ cleaning system for an e-beam reticle writer

Kenji Ohtoshi; Satoshi Yamasaki; Shuichi Tamamushi; Toru Tojo; Ryoichi Hirano; Yuuji Fukudome; Naoharu Shimomura; Shinsuke Nishimura; Shusuke Yoshitake; Munehiro Ogasawara

doi:10.1117/12.277287

28 July 1997 Development of an in-situ cleaning system for an e-beam reticle writer

Kenji Ohtoshi, Satoshi Yamasaki, Shuichi Tamamushi, Toru Tojo, Ryoichi Hirano, Yuuji Fukudome, Naoharu Shimomura, Shinsuke Nishimura, Shusuke Yoshitake, Munehiro Ogasawara

Author Affiliations +

Proceedings Volume 3096, Photomask and X-Ray Mask Technology IV; (1997) https://doi.org/10.1117/12.277287
Event: Photomask Japan '97, 1997, Kawasaki City, Japan

Abstract

We have newly designed and constructed a unique electron optical column installed with an in-situ cleaning system, applying the down-flow ashing process with a mixture O₂ and CF₄. We carried out in-situ cleaning using designed system, and confirmed that beam drift which is caused by charging up of a contamination layer was reduced.

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Kenji Ohtoshi, Satoshi Yamasaki, Shuichi Tamamushi, Toru Tojo, Ryoichi Hirano, Yuuji Fukudome, Naoharu Shimomura, Shinsuke Nishimura, Shusuke Yoshitake, and Munehiro Ogasawara "Development of an in-situ cleaning system for an e-beam reticle writer", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277287

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