Improving stress stability of Ta film for x-ray mask absorbers

Masatoshi Oda; Miho Sakatani; Shingo Uchiyama; Tadahito Matsuda

doi:10.1117/12.277258

28 July 1997 Improving stress stability of Ta film for x-ray mask absorbers

Masatoshi Oda, Miho Sakatani, Shingo Uchiyama, Tadahito Matsuda

Proceedings Volume 3096, Photomask and X-Ray Mask Technology IV; (1997) https://doi.org/10.1117/12.277258
Event: Photomask Japan '97, 1997, Kawasaki City, Japan

Abstract

Stress in Ta films, which are excellent films for x-ray mask absorbers, gradually changes to compressive in air. The characteristics and a way to prevent the variation were investigated. The stress variation increases as pressure during Ta deposition is increased and decreases with increasing Ta thickness. These phenomena can be explained using a previously reported model of oxygen diffusion along the grain boundaries. The stress variation can be prevented by annealing in N₂ atmosphere after deposition. A very short annealing is enough to stabilize even Ta film stress with large variation. The annealing causes the stress to shift to compressive, so it allows us to precisely control the stress. The annealing does not affect etching characteristics of the film.

Citation Download Citation

Masatoshi Oda, Miho Sakatani, Shingo Uchiyama, and Tadahito Matsuda "Improving stress stability of Ta film for x-ray mask absorbers", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277258

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