Paper
17 September 1997 Microellipsometric surface measurement
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Proceedings Volume 3098, Optical Inspection and Micromeasurements II; (1997) https://doi.org/10.1117/12.281152
Event: Lasers and Optics in Manufacturing III, 1997, Munich, Germany
Abstract
Surface measurement is an important tool for quality control In our contribution we describe a novel application of reflection ellipsometry to profile measurement and material detection. The ellipsometric parameters (Delta) and (Psi) are measured by using a PSA-ellipsometer arrangement and a 4- zone-intensity-ellipsometric algorithm. To achieve a high lateral resolution we focus the laser beam on the surface through a microscope objective with high numerical aperture. The spot diameter is in the order to 1 micrometers . The focus adjustment is carried out by an integrated autofocus system. From the ellipsometric parameters we conclude to the refractive index of the local surface material and the local surface gradients. The height profile is calculated by an integrating and filtering algorithm. The material is ascertained form the refractive index. The feasibility of our novel microellipsometric measurement system is demonstrated by several tests. Measurements of material transitions and the height profile of a glass surface standard are presented.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jochen Doberitzsch, Wolfgang Holzapfel, and Ulrich Neuschaefer-Rube "Microellipsometric surface measurement", Proc. SPIE 3098, Optical Inspection and Micromeasurements II, (17 September 1997); https://doi.org/10.1117/12.281152
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KEYWORDS
Refractive index

Objectives

Sensors

Glasses

Microscopes

Beam splitters

Reflection

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