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11 July 1997 Beamline for metrology of x-ray/EUV optics at the Advanced Light Source
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Abstract
We describe a bending magnet beamline for the characterization of optical elements (mirrors, gratings, multilayers, detectors, etc.) in the energy range 50 - 1000 eV. Although it was designed primarily for precision reflectometry of multilayer reflecting optics for EUV projection lithography, it has capabilities for a wide range of measurements. The optics consist of a monochromator, a reflectometer, a 3-mirror order suppressor, and focusing mirrors to provide a small spot on the sample. The monochromator is a very compact entrance slitless, varied line spacing plane grating design in which the mechanically ruled grating operates in the converging light from a spherical mirror working at high demagnification. Aberrations of the mirror are corrected by the line spacing variation, so that the spectral resolving power (lambda) /(Delta) (lambda) is limited by the ALS source size to about 7000. Wavelength is scanned by simple rotation of the grating with a fixed exit slit. The reflectometer has the capability of positioning the sample to 10 micrometer and setting its angular position to 0.002 degrees. LABVIEWTM based software provides a convenient interface to the user. The reflectometer is separated from the beamline by a differential pump, and can be pumped down in 1/2 hour. Auxiliary experimental stations can be mounted behind the reflectometer. Results are shown which demonstrate the performance and operational convenience of the beamline.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James H. Underwood, Eric M. Gullikson, Masato Koike, and Phillip J. Batson "Beamline for metrology of x-ray/EUV optics at the Advanced Light Source", Proc. SPIE 3113, Grazing Incidence and Multilayer X-Ray Optical Systems, (11 July 1997); https://doi.org/10.1117/12.278850
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