Paper
15 October 1997 Multilayer coatings for narrowband imaging in the extreme ultraviolet
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Abstract
Multilayer coatings for narrowband imaging in the extreme ultraviolet (EUV) have been designed and prepared. Multilayers were designed to optimize reflectivity at O+ 83.4 nm spectral line, and simultaneously to reject radiation at 121.6 nm Lyman (alpha) hydrogen line. Al/MgF2/Mo multilayer coatings were prepared and high reflection/suppression ratios at the above wavelengths were measured. The coatings also exhibited a dip in reflectivity at 102.6 nm Lyman (beta) . The coatings showed some slow degradation over time, but maintained a high reflection/suppression ratio after a few months. Sample cleaning was found effective in restoring a very low reflectivity at 121.6 nm for samples aged of over 100 days.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juan I. Larruquert and Ritva A. M. Keski-Kuha "Multilayer coatings for narrowband imaging in the extreme ultraviolet", Proc. SPIE 3114, EUV, X-Ray, and Gamma-Ray Instrumentation for Astronomy VIII, (15 October 1997); https://doi.org/10.1117/12.283794
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KEYWORDS
Reflectivity

Multilayers

Molybdenum

Magnesium fluoride

Aluminum

Extreme ultraviolet

Silicon carbide

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