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13 October 1997 Mapping of the lateral polar orientational distribution in second-order nonlinear thin films by scanning second-harmonic microscopy (SSHM)
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Abstract
We present a novel nondestructive experimental technique for the determination of the lateral distribution of the polar order in second order nonlinear optical (NLO) thin films. The sample, which consists of a poled polymer film, is scanned through the focus of an infrared laser beam in a second harmonic generation (SHG) setup and the second harmonic intensity is monitored stepwise. In combination with a conventional electrooptic (EO) characterization it is possible to create an EO-coefficient map of the sample. The resolution of this mapping technique can be significantly increased by using high numerical aperture (NA) microscope optics for the illumination of the poled polymer. This method, for instance, allows the evaluation ofpoling inhomogeneities due to high field poling and field distortions at the edges ofpoling electrodes.
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Markus Adameck, Jan Vydra, Robert Blum, T. Stollhof, G. Karrasch, and Manfred Eich "Mapping of the lateral polar orientational distribution in second-order nonlinear thin films by scanning second-harmonic microscopy (SSHM)", Proc. SPIE 3147, Nonlinear Optical Properties of Organic Materials X, (13 October 1997); https://doi.org/10.1117/12.284245
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