Paper
11 December 1997 Progress in silicon-to-silicon direct bonding and its application to synchrotron x-ray optics
Timothy Graber, S. Felix Krasnicki, Patricia B. Fernandez, Dennis M. Mills, Qin-Yi Tong, Ulrich M. Goesele
Author Affiliations +
Abstract
X-ray optical elements (such as single-crystal silicon monochromators) illuminated with high-power synchrotron- radiation beams produced by insertion devices and, to a lesser extent bending magnets, require cooling. When operating a silicon crystal at room temperature, channels for the coolant are often fabricated directly beneath the diffracting surface. Then a separate silicon distribution manifold/plenum is manufactured, and the components are bonded together using an adhesive or some intermediate material. In many cases, such monochromators suffer from strains induced by the bond. A silicon-to-silicon direct- bonding technique (i.e., without any intermediate material) has been developed that appears to be an attractive method for creating a bond with less strain between two pieces of silicon. This technique is well understood for the case of thin wafers (approximately 0.5 mm thickness) and is used by the semiconductor industry. Recently, bonding of 16-mm-thick 10-cm-diameter silicon crystals has been successfully performed inducing very little strain. A short review of the silicon-to-silicon direct-bonding process will be presented with an emphasis on its application to room temperature high-heat-load x-ray optics along with the present status of direct bonding efforts at the APS.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Timothy Graber, S. Felix Krasnicki, Patricia B. Fernandez, Dennis M. Mills, Qin-Yi Tong, and Ulrich M. Goesele "Progress in silicon-to-silicon direct bonding and its application to synchrotron x-ray optics", Proc. SPIE 3151, High Heat Flux and Synchrotron Radiation Beamlines, (11 December 1997); https://doi.org/10.1117/12.294498
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Silicon

Crystals

Semiconducting wafers

X-ray optics

Monochromators

Wafer bonding

Manufacturing

RELATED CONTENT

Modeling of heat bump formation in x ray optics under...
Proceedings of SPIE (September 04 2009)
New beamline optics of the x ray undulator BW1 at...
Proceedings of SPIE (November 22 1996)
One-movement fixed-exit channel-cut monochromator
Proceedings of SPIE (December 11 1998)
Mosaic monochromator applications at CHESS
Proceedings of SPIE (December 11 1998)

Back to Top