Translator Disclaimer
Paper
14 October 1997 Low-debris laser plasma source
Author Affiliations +
Abstract
In this paper we describe a low debris laser plasma source with cryogenic CO2 target developed in our institute, which can emit strong line radiation in EUV region even in water window. In particular the source is a very important candidate radiation source for the future EUV lithography production line.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bo Chen, Jinquang Lin, Xin Zhang, and Jianlin Cao "Low-debris laser plasma source", Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); https://doi.org/10.1117/12.290264
PROCEEDINGS
4 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT


Back to Top