X-ray photoelectron spectroscopy with a laser plasma source

Toshihisa Tomie; Hiroyuki Kondo; Hideaki Shimizu; Peixiang Lu

doi:10.1117/12.290265

14 October 1997 X-ray photoelectron spectroscopy with a laser plasma source

Toshihisa Tomie, Hiroyuki Kondo, Hideaki Shimizu, Peixiang Lu

Proceedings Volume 3157, Applications of X Rays Generated from Lasers and Other Bright Sources; (1997) https://doi.org/10.1117/12.290265
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

For the study of future nm devices, electronic and chemical states must be observed with nm resolution, and a photoelectron microscope is strongly desired to be developed. A compact system for in-house analysis can be realized with a laser-plasma x-ray source. Experimental results confirm that an x-ray photoelectron microscope with a laser-plasma can become a powerful tool with potential spectrum acquisition time comparable to that with a synchrotron source. Reported are high energy resolution photoelectron spectra for Si revealing the existence of surface states, and 2-D mapping with resolution of 60 micrometers demonstrating that simultaneous detection of multi-elements by the time-of-flight energy analysis is powerful in obtaining a reliable mapping. High electron detection efficiency of the system with a pulse source is discussed to be essentially important for nm resolution.

Citation Download Citation

Toshihisa Tomie, Hiroyuki Kondo, Hideaki Shimizu, and Peixiang Lu "X-ray photoelectron spectroscopy with a laser plasma source", Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); https://doi.org/10.1117/12.290265

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