Paper
18 August 1997 Numerical prediction of etched profile in pyrolytic laser etching
Teng Soon Wee, Yongfeng Lu, Wai Kin Chim
Author Affiliations +
Proceedings Volume 3184, Microelectronic Packaging and Laser Processing; (1997) https://doi.org/10.1117/12.280576
Event: ISMA '97 International Symposium on Microelectronics and Assembly, 1997, Singapore, Singapore
Abstract
A quasi-static 2D heat conduction analysis is used to deduce the geometrical profile of a cavity pyrolytically etched on an isotropic silicon substrate by a stationary CW Ar+ laser with a Gaussian intensity profile. Starting with a substrate having a flat surface, the analysis progressively removes regions of the substrate to model the actual etching action. The finite element method is used to solve the non- linear problem iteratively. Multiple reflections of the laser beam in the etched cavity are also modeled assuming that the substrate surface is perfectly diffused. Laser etching experiments performed on a silicon substrate in a CCl4 gas ambient are used to verify the numerical routine. Comparison with the numerical results indicates that the desorption of SiCl2 radicals is probably responsible for the final etched profile obtained. Deposition of the residue from the chemical etching was also observed in the etched cavity. The re-deposition was found to proceed in different manners for stationary and scanning beams. These differing actions of re-deposition are explained in the context of the different temperature distributions induced in the two cases.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Teng Soon Wee, Yongfeng Lu, and Wai Kin Chim "Numerical prediction of etched profile in pyrolytic laser etching", Proc. SPIE 3184, Microelectronic Packaging and Laser Processing, (18 August 1997); https://doi.org/10.1117/12.280576
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Etching

Semiconductor lasers

Silicon

Argon

Autoregressive models

Continuous wave operation

Finite element methods

RELATED CONTENT

Contactless laser bending of silicon microstructures
Proceedings of SPIE (April 24 2003)
Single mode quantum cascade lasers
Proceedings of SPIE (November 17 2005)
Over 100 mW blue violet laser diodes for Blu ray...
Proceedings of SPIE (May 11 2004)
Laser - Assisted Chemical Etching
Proceedings of SPIE (June 14 1984)

Back to Top