Paper
12 February 1997 Integration of KLA Starlight for phase-shift mask manufacturing
Denis M. Rigaill
Author Affiliations +
Abstract
In the chrome-on-glass photomask inspection arena, KLA Starlight tool is mostly used in manufacturing mode as a particle detector and final plate quality verification, before mounting the pellicle, after pelliclization or both. When it applies to phase-shift reticles -- embedded attenuated as well as PhaseEdge --, there are other applications of Starlight defect detectivity, in addition to the above. This paper describes uses of Starlight technology at several process steps of PSM manufacturing. It addresses case of I-line and DUV Cr/MoSi embedded attenuated and multiple level quartz- etched alternating. Illustrations provided show several typical defect. Finally challenge to migrate from a development use into a full manufacturing integration is discussed. Based on Starlight performance, the price to pay to extend use of initially binary chrome-on-glass tool designed for production of phase-shift reticles is seized.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Denis M. Rigaill "Integration of KLA Starlight for phase-shift mask manufacturing", Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); https://doi.org/10.1117/12.301184
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Manufacturing

Inspection

Photomasks

Reticles

Quartz

Calibration

Photoresist processing

Back to Top