Optical Properties Of Sputtered Si: H

P. M. Martin; W. T. Pawlewicz; I. B. Mann

doi:10.1117/12.933272

12 April 1982 Optical Properties Of Sputtered Si: H

P. M. Martin, W. T. Pawlewicz, I. B. Mann

Proceedings Volume 0324, Optical Coatings for Energy Efficiency and Solar Applications; (1982) https://doi.org/10.1117/12.933272
Event: 1982 Los Angeles Technical Symposium, 1982, Los Angeles, United States

Abstract

Sputtered Si:H is a very promising material for use in thin-film solar cells, solar selective absorbers and optical coatings for the near infrared region. Optical property-composition relationships have been determined for Si:H coatings having wide ranges of H content and Si-H bonding. The dependence of the optical absorption edge, optical band gap and refractive index at 2 μm wavelength on H content and Si-H bonding is described. Microstructural and topographical features of the films that influence their absorption and scattering characteristics are discussed. Composition and bonding diagrams used to select deposition conditions for the desired optical properties are also presented. Finally, multilayer Si:H/Si0₂ all-dielectric laser mirrors with reflectances greater than 99% at 1.315, 2.7 and 3.8 μm are described to illustrate the application of these coatings.

Citation Download Citation

P. M. Martin, W. T. Pawlewicz, and I. B. Mann "Optical Properties Of Sputtered Si: H", Proc. SPIE 0324, Optical Coatings for Energy Efficiency and Solar Applications, (12 April 1982); https://doi.org/10.1117/12.933272

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