Titanium nitride film prepared by ion-beam-enhanced deposition

Han-wei Liu; Zhidong Huang; Yuan-ru Chen

doi:10.1117/12.293488

14 November 1997 Titanium nitride film prepared by ion-beam-enhanced deposition and its properties

Han-wei Liu, Zhidong Huang, Yuan-ru Chen

Proceedings Volume 3241, Smart Materials, Structures, and Integrated Systems; (1997) https://doi.org/10.1117/12.293488
Event: Far East and Pacific Rim Symposium on Smart Materials, Structures, and MEMS, 1997, Adelaide, Australia

Abstract

The titanium nitride film has been synthesized by electron beam evaporation depositino f titanium and bombardment with a xenon ion beam in th environment of nitrogen gas. The component, valence state and structure of titanium nitride film ar analyzed by means of XPS, AES, and X-ray difraction. The reslts shows that th main cooposition of the film are titnaium nitride crystallites with preferentia orientatinslightly and fine gran size,exept predominant titanium oxide film on surface of thefilm and there exists a signficiant mixed layser of titanium, nitrogen and ferrum between the film and its matrix, whichplayed an important role for increasing adhesion between the film and substrate. finally, its some properties have been investigated.

Citation Download Citation

Han-wei Liu, Zhidong Huang, and Yuan-ru Chen "Titanium nitride film prepared by ion-beam-enhanced deposition and its properties", Proc. SPIE 3241, Smart Materials, Structures, and Integrated Systems, (14 November 1997); https://doi.org/10.1117/12.293488

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