Paper
20 April 1998 Improvement of laser-induced surface damage in CsLiB6O10 crystal by ion etching
Tomosumi Kamimura, Masashi Yoshimura, Takahiro Inoue, Yusuke Mori, Takatomo Sasaki, Hidetsugu Yoshida, Masahiro Nakatsuka, Kunio Yoshida, Kyoichi Deki, Masahiro Horiguchi
Author Affiliations +
Abstract
This paper investigates ion etching process to the surface of CsLiB6O10 (CLBO) crystal. Laser-induced surface damage was reduced and surface durability of CLBO crystal was improved by removing the subsurface embedded polishing compound. There was no surface degradation as a result of the ion etching. The effects of ion etching on surface damage were measured by a 1-on-1 test at a laser wavelength of 266 nm. Durability of the CLBO crystal was tested by the approximately 7 W fourth harmonic generated by a Nd:YAG laser. The durability of the ion etched surface was improved more than 10 times as compared with the as-polished surface.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tomosumi Kamimura, Masashi Yoshimura, Takahiro Inoue, Yusuke Mori, Takatomo Sasaki, Hidetsugu Yoshida, Masahiro Nakatsuka, Kunio Yoshida, Kyoichi Deki, and Masahiro Horiguchi "Improvement of laser-induced surface damage in CsLiB6O10 crystal by ion etching", Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); https://doi.org/10.1117/12.307000
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CITATIONS
Cited by 4 scholarly publications and 1 patent.
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KEYWORDS
Ions

Crystals

Etching

Laser crystals

Surface finishing

Laser induced damage

Nd:YAG lasers

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