Laser-induced damage of fused silica at 355 nm initiated at scratches

Alberto Salleo; Francois Y. Genin; J. M. Yoshiyama; Christopher J. Stolz; Mark R. Kozlowski

doi:10.1117/12.307039

20 April 1998 Laser-induced damage of fused silica at 355 nm initiated at scratches

Alberto Salleo, Francois Y. Genin, J. M. Yoshiyama, Christopher J. Stolz, Mark R. Kozlowski

Proceedings Volume 3244, Laser-Induced Damage in Optical Materials: 1997; (1998) https://doi.org/10.1117/12.307039
Event: Laser-Induced Damage in Optical Materials: 1997, 1997, Boulder, CO, United States

Abstract

Scratches of measured width were produced on the surface of a IV grade fused silica window using a diamond tip. Two scratch morphologies were observed: plastic and brittle. The scratches were irradiated with a 355 nm laser pulse. The laser-induced damage threshold (LIDT) of the unscratched output surface was 15 J/cm² at 3-ns. The LIDT of the scratched surface as a function of scratch width was then measured for both input and output surface scratches. Input surface scratches of width smaller than 10 micrometers did not influence the LIDT of the silica window. On the output surface, 7 $mUm wide scratches lowered the LIDT by a factor of two. For larger scratches, the LIDT reached an asymptotic value of 5 J/cm² on both input and output surface. Possible reasons for this LIDT drop could be electric field enhancement in the cracks below the scratch, the presence of contamination particles in the scratch, or the weakening of the material because of existing mechanical flaws.

Citation Download Citation

Alberto Salleo, Francois Y. Genin, J. M. Yoshiyama, Christopher J. Stolz, and Mark R. Kozlowski "Laser-induced damage of fused silica at 355 nm initiated at scratches", Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); https://doi.org/10.1117/12.307039

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