Fluoride thin films for reflective coatings at 157 nm

Ronald L. J. Cowell

doi:10.1117/12.308091

12 May 1998 Fluoride thin films for reflective coatings at 157 nm

Ronald L. J. Cowell

Proceedings Volume 3268, Gas and Chemical Lasers and Intense Beam Applications; (1998) https://doi.org/10.1117/12.308091
Event: Optoelectronics and High-Power Lasers and Applications, 1998, San Jose, CA, United States

Abstract

An overview of the excimer laser market shows the trend towards shorter operating wavelengths. The optical properties of vacuum ultraviolet materials are described and the design of a reflective fluoride multilayer coating for 157 nm is given. Practical considerations and techniques used for the coating manufacture are discussed. Results on coating performance and film properties are presented. Finally, a summary reviews the relevant aspects and salient points encountered during the project with an indication of the direction of any subsequent follow-up work.

Citation Download Citation

Ronald L. J. Cowell "Fluoride thin films for reflective coatings at 157 nm", Proc. SPIE 3268, Gas and Chemical Lasers and Intense Beam Applications, (12 May 1998); https://doi.org/10.1117/12.308091

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