Paper
1 April 1998 Comparison of surface PSDs calculated from both AFM profiles and scatter data
Author Affiliations +
Abstract
The paper reviews the process for comparing PSD's generated by profile measurements and scatter measurements. Rayleigh scatter as a noise source is reviewed and a new polarization based measurement is presented for discrimination between roughness scatter and particulate scatter. AFM results are compared for both a molybdenum mirror and a silicon wafer. The mirror compares well but 2D detrending technique used impacts the results for the wafer.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John C. Stover, Vladimir I. Ivakhnenko, and Craig A. Scheer "Comparison of surface PSDs calculated from both AFM profiles and scatter data", Proc. SPIE 3275, Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II, (1 April 1998); https://doi.org/10.1117/12.304410
Lens.org Logo
CITATIONS
Cited by 4 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Scatter measurement

Semiconducting wafers

Spatial frequencies

Mirrors

Silicon

Bidirectional reflectance transmission function

Molybdenum

Back to Top