Modeling of scatter from small pits of arbitrary shape

Vladimir I. Ivakhnenko; Craig A. Scheer; John C. Stover

doi:10.1117/12.304396

1 April 1998 Modeling of scatter from small pits of arbitrary shape

Vladimir I. Ivakhnenko, Craig A. Scheer, John C. Stover

Proceedings Volume 3275, Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II; (1998) https://doi.org/10.1117/12.304396
Event: Optoelectronics and High-Power Lasers and Applications, 1998, San Jose, CA, United States

Abstract

Computer simulations of scatter from various surface features are very important for addressing the design issues associated with producing scanners to meet evolving industry needs. This paper deals with mathematical modeling of light scattering by small pits of arbitrary shape on the surface of silicon wafers. The code based on method of moments applied to the volume integral equation, has been developed, and the numerically modeled differential scattering cross- section is presented for various types of pits. Pit shape and orientation are investigated.

Citation Download Citation

Vladimir I. Ivakhnenko, Craig A. Scheer, and John C. Stover "Modeling of scatter from small pits of arbitrary shape", Proc. SPIE 3275, Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II, (1 April 1998); https://doi.org/10.1117/12.304396

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