Design and fabrication of optical MEMS using a four-level planarized surface-micromachined polycrystalline silicon process

M. Adrian Michalicek; John H. Comtois; Heather K. Schriner

doi:10.1117/12.302408

15 March 1998 Design and fabrication of optical MEMS using a four-level planarized surface-micromachined polycrystalline silicon process

M. Adrian Michalicek, John H. Comtois, Heather K. Schriner

Author Affiliations +

Proceedings Volume 3276, Miniaturized Systems with Micro-Optics and Micromechanics III; (1998) https://doi.org/10.1117/12.302408
Event: Optoelectronics and High-Power Lasers and Applications, 1998, San Jose, CA, United States

Abstract

This paper describes the design and fabrication of optical microelectromechanical systems devices using the Sandia Ultra-planar Multi-level MEMS Technology fabrication process. This state-of-the-art process, offered by Sandia National Laboratories, provides unique and very advantageous features which make it ideal for optical devices such as micromirrors. This enabling process permits the development of micromirror devices with near-ideal characteristics which have previously been unrealizable in standard polysilicon processes. This paper describes many of these characteristics such as elevated address electrodes, various address wiring techniques, planarized mirror surfaces using Chemical Mechanical Polishing, unique post-process metallization, and the best active surface area to date.

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M. Adrian Michalicek, John H. Comtois, and Heather K. Schriner "Design and fabrication of optical MEMS using a four-level planarized surface-micromachined polycrystalline silicon process", Proc. SPIE 3276, Miniaturized Systems with Micro-Optics and Micromechanics III, (15 March 1998); https://doi.org/10.1117/12.302408

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