Paper
7 April 1998 Plasma-assisted molecular beam epitaxial growth and characterization of zincblende (In,Al,Ga)N heterostructures on GaAs(001)
Jochen R. Muellhaeuser, B. Jenichen, Achim Trampert, Matthias Wassermeier, Oliver Brandt, Klaus H. Ploog
Author Affiliations +
Abstract
We report on successful growth of zincblende ((beta) ) (In,Al,Ga)N heterostructures on GaAs(001) by means of rf plasma assisted molecular beam epitaxy. The composition of the samples under investigation is analyzed by secondary ion mass spectroscopy and x-ray diffraction. Cross-sectional transmission electron microscopy is used for studying the microstructure and selected area diffraction for verifying the phase purity of the epilayers. The surface morphology is investigated by atomic force microscopy. Temperature dependent transmission, reflectance, and photoluminescence investigations allow the determination of the band gap energy of (beta) -InxGa1-xN. It is shown that by using (beta) -InxGa1-xN blue and green band-edge related emission is obtained with respectively, x equals 0.17 and x equals 0.4 in contrast to wurtzite InxGa1-xN where In contents of about x equals 0.25 and x equals 0.55 are required for achieving the respective colors.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jochen R. Muellhaeuser, B. Jenichen, Achim Trampert, Matthias Wassermeier, Oliver Brandt, and Klaus H. Ploog "Plasma-assisted molecular beam epitaxial growth and characterization of zincblende (In,Al,Ga)N heterostructures on GaAs(001)", Proc. SPIE 3279, Light-Emitting Diodes: Research, Manufacturing, and Applications II, (7 April 1998); https://doi.org/10.1117/12.304429
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KEYWORDS
Gallium nitride

Luminescence

Gallium arsenide

Reflectivity

Heterojunctions

Transmission electron microscopy

Absorption

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