Thermo-optic properties of aluminum nitride waveguides

Xiao Tang; Yifang Yuan; Kobchat Wongchotigul; Michael G. Spencer; Han Ying; Zhang Ling

doi:10.1117/12.316647

7 July 1998 Thermo-optic properties of aluminum nitride waveguides

Xiao Tang, Yifang Yuan, Kobchat Wongchotigul, Michael G. Spencer, Han Ying, Zhang Ling

Proceedings Volume 3283, Physics and Simulation of Optoelectronic Devices VI; (1998) https://doi.org/10.1117/12.316647
Event: Optoelectronics and High-Power Lasers and Applications, 1998, San Jose, CA, United States

Abstract

Aluminum nitride (AlN) thin film is a wide bandgap semiconductor which shows great potential for opto- electronic applications in blue and ultraviolet regions. A prism-thin film coupling technique, and an automatic temperature controlling device have been used to study the thermo-optic properties of single crystalline aluminum nitride thin films grown on sapphire substrates by low pressure metal organic chemical vapor deposition. The temperature coefficient of refractive index n_e for AlN is determined to be 6 X 10^-5/ degree(s)C at a wavelength of 632.8 nm.

Citation Download Citation

Xiao Tang, Yifang Yuan, Kobchat Wongchotigul, Michael G. Spencer, Han Ying, and Zhang Ling "Thermo-optic properties of aluminum nitride waveguides", Proc. SPIE 3283, Physics and Simulation of Optoelectronic Devices VI, (7 July 1998); https://doi.org/10.1117/12.316647

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