Enhancement mechanisms in the SERS phenomenon

Stefan Kruszewski

doi:10.1117/12.301353

1 January 1998 Enhancement mechanisms in the SERS phenomenon

Stefan Kruszewski

Proceedings Volume 3320, Tenth Polish-Czech-Slovak Optical Conference: Wave and Quantum Aspects of Contemporary Optics; (1998) https://doi.org/10.1117/12.301353
Event: Tenth Polish-Czech-Slovak Optical Conference: Wave and Quantum Aspects of Contemporary Optics, 1996, Karpacz, Poland

Abstract

A submicroscopic surface roughness as well as the atomic scale roughness are required for the observations of the strong SERS signal. The submicroscopic roughness is necessary to occur the electromagnetic enhancement of Raman scattered light, whereas the atomic scale roughness, i.e. the existence of the 'active sites' on the surface, plays the crucial role in the chemical enhancement. Accordingly to the prediction of electromagnetic model (EM), the SERS intensity depends on the size and shape of grains forming the rough surface. Additionally, as it predicts the chemical model, the SERS intensity depends on the concentration of 'active sites' on the surface. The performed investigations of the SERS intensity dependence on the variations of roughness, confirm the EM model. On the other hand, the observed correlation between the changes of SERS intensity and the changes of intensity of reflected light seems to prove that the SERS-active surface exhibits the absorption band associated with the charge-transfer transition within the complexes active site-adsorbed molecule.

Citation Download Citation

Stefan Kruszewski "Enhancement mechanisms in the SERS phenomenon", Proc. SPIE 3320, Tenth Polish-Czech-Slovak Optical Conference: Wave and Quantum Aspects of Contemporary Optics, (1 January 1998); https://doi.org/10.1117/12.301353

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