Characterization of the accuracy of EUV phase-shifting point diffraction interferometry

Patrick P. Naulleau; Kenneth A. Goldberg; Sang Hun Lee; Chang-Hasnain C. Chang; Cynthia J. Bresloff; Phillip J. Batson; David T. Attwood Jr.; Jeffrey Bokor

doi:10.1117/12.309563

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5 June 1998 Characterization of the accuracy of EUV phase-shifting point diffraction interferometry

Patrick P. Naulleau, Kenneth A. Goldberg, Sang Hun Lee, Chang-Hasnain C. Chang, Cynthia J. Bresloff, Phillip J. Batson, David T. Attwood Jr., Jeffrey Bokor

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Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309563
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The phase-shifting point diffraction interferometer (PS/PDI) has recently been developed and implement at Lawrence Berkeley National Laboratory to meet the significant measurement challenge of characterizing extreme UV (EUV) projection lithography systems. Here progress on the characterization of the PS/PDI accuracy is presented. Two major classes of errors affect the accuracy of the interferometer: the first being systematic effects arising from the measurement geometry, and the second being random and systematic errors caused by an imperfect reference wave. In order to characterize these contribution and calibrate the interferometer. Experimental results demonstrating a systematic-error-limited accuracy of 0.004 waves is reported.

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Patrick P. Naulleau, Kenneth A. Goldberg, Sang Hun Lee, Chang-Hasnain C. Chang, Cynthia J. Bresloff, Phillip J. Batson, David T. Attwood Jr., and Jeffrey Bokor "Characterization of the accuracy of EUV phase-shifting point diffraction interferometry", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309563

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