Extension of the traditional optical model for investigation into EUV projection lithography capabilities

Vladimir V. Ivin; Kevin D. Lucas; Tariel M. Makhviladze; Vadim V. Manuylov; Marina G. Medvedeva

doi:10.1117/12.309628

5 June 1998 Extension of the traditional optical model for investigation into EUV projection lithography capabilities

Vladimir V. Ivin, Kevin D. Lucas, Tariel M. Makhviladze, Vadim V. Manuylov, Marina G. Medvedeva

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309628
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

A traditional aerial image model has been used to demonstrate a good applicability of 13nm EUV projection lithography to printing sub-0.1mm features. To estimate the potential of a possible candidate for EUV optics--a two- mirror projection system, we investigated the issues of aerial image formation by the reflective optics with account for aberrations. We have developed a simplified method to determine the optical parameters of the ring-field system that minimize aberrations of the 3rd order and, partially, of the 5th. As a result, we have found that the uncompensated aberrations contribute to a sharply asymmetrical impulse response of the ring-field projection system, where the characteristic width of the impulse response in some directions might be two times larger than the diffraction limit.

Citation Download Citation

Vladimir V. Ivin, Kevin D. Lucas, Tariel M. Makhviladze, Vadim V. Manuylov, and Marina G. Medvedeva "Extension of the traditional optical model for investigation into EUV projection lithography capabilities", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309628

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