Influence of lens aberrations on high-resolution imaging on low-reflectivity substrates

Brian Martin; Graham G. Arthur; Christine Wallace

doi:10.1117/12.308746

8 June 1998 Influence of lens aberrations on high-resolution imaging on low-reflectivity substrates

Brian Martin, Graham G. Arthur, Christine Wallace

Proceedings Volume 3332, Metrology, Inspection, and Process Control for Microlithography XII; (1998) https://doi.org/10.1117/12.308746
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

This paper investigates photoresist profiles on low reflectivity substrates with respect to numerical aperture and position in lens field. Results suggest a link between resist wall angle and substrate reflectivity which is influenced by lens aberrations.

Citation Download Citation

Brian Martin, Graham G. Arthur, and Christine Wallace "Influence of lens aberrations on high-resolution imaging on low-reflectivity substrates", Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); https://doi.org/10.1117/12.308746

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