Design of an etch-resistant cyclic olefin photoresist

Robert D. Allen; Juliann Opitz; Thomas I. Wallow; Richard A. Di Pietro; Donald C. Hofer; Saikumar Jayaraman; Karen A. Hullihan; Larry F. Rhodes; Brian L. Goodall; Robert A. Shick

doi:10.1117/12.312472

29 June 1998 Design of an etch-resistant cyclic olefin photoresist

Robert D. Allen, Juliann Opitz, Thomas I. Wallow, Richard A. Di Pietro, Donald C. Hofer, Saikumar Jayaraman, Karen A. Hullihan, Larry F. Rhodes, Brian L. Goodall, Robert A. Shick

Author Affiliations +

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312472
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

In the quest for a high performance 193 nm photoresist with robust plasma etching resistance equivalent to or better than the DUV resists of today, we have focused on the use of cyclic olefin polymers. In this paper, we will discuss monomer synthesis, polymerization approaches, polymer properties and early lithographic results of 193 nm photoresists formulated from cyclic olefin polymeric materials made from a metal-catalyzed addition polymerization process. The goal of this work is to produce a 193 nm photoresist with excellent imaging performance and etch resistance exceeding DUV resists, and in fact approaching novolak-based photoresists.

Citation Download Citation

Robert D. Allen, Juliann Opitz, Thomas I. Wallow, Richard A. Di Pietro, Donald C. Hofer, Saikumar Jayaraman, Karen A. Hullihan, Larry F. Rhodes, Brian L. Goodall, and Robert A. Shick "Design of an etch-resistant cyclic olefin photoresist", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312472

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