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29 June 1998 Lithographic evaluation of a new high-performance photoresist composition
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Abstract
`Non-critical' levels such as implant layer consume a large volume of photoresist. This work was done to choose a cost- effective, high performance implant resist implant resist. IN addition to resolution considerations, outgassing during implant, speed and cost were all evaluated to choose the successful candidate. Through this effort a new resist formulation, SumiresistTM PFM-10 was compared with other existing I-line formulations.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Warren Montgomery, Neal P. Callan, and Alan E. Kozlowski "Lithographic evaluation of a new high-performance photoresist composition", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312353
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