New method for improving the practical resolution of complex patterns in sub-half-micron lithography

Xunan Chen; Xiangang Luo; HanMin Yao; Qian Xiao; Guobin Yu

doi:10.1117/12.310786

29 June 1998 New method for improving the practical resolution of complex patterns in sub-half-micron lithography

Xunan Chen, Xiangang Luo, HanMin Yao, Qian Xiao, Guobin Yu

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310786
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

A new approach, based on the optimization of illumination light by micro-optical element, is applied to improve the practical resolution of complex pattern in sub-half micron lithography. Several micro optical plates are devised to optimize the illumination light. Through the detailed theoretical expansion of the optics for the new structure, simulation of the aerial image is carried out. And the experiments verify the results of simulation.

Citation Download Citation

Xunan Chen, Xiangang Luo, HanMin Yao, Qian Xiao, and Guobin Yu "New method for improving the practical resolution of complex patterns in sub-half-micron lithography", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310786

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