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29 June 1998 Surface finish and optical quality of CaF2 for UV lithography applications
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Abstract
CaF2 has received increasing attention as a promising substrate for coatings in the VUV range. Optimization of the optical properties of these optical components requires the study of basic characteristics of the coated and uncoated CaF2 substrates such as surface roughness, optical performance, absorption and scatter losses, and laser induced damage threshold. The investigations reveal the influence of different substrate polishing grades on the quality of the coated components.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Angela Duparre, Roland Thielsch, Norbert Kaiser, Stefan Jakobs, Klaus R. Mann, and Eric Eva "Surface finish and optical quality of CaF2 for UV lithography applications", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310735
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