Three-dimensional mask transmission simulation using a single integral equation method

Michael S. Yeung; Eytan Barouch

doi:10.1117/12.310803

29 June 1998 Three-dimensional mask transmission simulation using a single integral equation method

Michael S. Yeung, Eytan Barouch

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310803
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

A single integral equation formulation for electromagnetic scattering from three-dimensional dielectric objects is discussed. The new formulation converges significantly faster than the traditional, coupled integral equation formulation. The new formulation is extended to incorporate the exact boundary conditions for isolated mask features by using dyadic Green's functions for the stratified medium background. Results of three-dimensional phase-shifting mask simulation are presented.

Citation Download Citation

Michael S. Yeung and Eytan Barouch "Three-dimensional mask transmission simulation using a single integral equation method", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310803

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