Paper
13 September 1982 Registration Accuracy In Several Versions Of A Scanning 1:1 Optical Projection System
Rene Vervoordeldonk, Peter Willemse, Roel Kramer, Tony Cowburn
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Abstract
The factors influencing registration accuracy in a scanning 1:1 optical projection system are investigated. The overall registration accuracy in several versions of this system is evaluated. Data was gathered either optically, using Vernier patterns, or electrically, using an automated measurement technique.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rene Vervoordeldonk, Peter Willemse, Roel Kramer, and Tony Cowburn "Registration Accuracy In Several Versions Of A Scanning 1:1 Optical Projection System", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933556
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KEYWORDS
Semiconducting wafers

Distortion

Photomasks

Optical alignment

Data modeling

Optical scanning systems

Image registration

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