Ultrafast ablation with high-pulse-rate Nd:YAG lasers: II. Experiments on deposition of diamondlike carbon films

Andrei V. Rode; Barry Luther-Davies; Eugene G. Gamaly

doi:10.1117/12.321555

14 September 1998 Ultrafast ablation with high-pulse-rate Nd:YAG lasers: II. Experiments on deposition of diamondlike carbon films

Andrei V. Rode, Barry Luther-Davies, Eugene G. Gamaly

Author Affiliations +

Proceedings Volume 3343, High-Power Laser Ablation; (1998) https://doi.org/10.1117/12.321555
Event: High-Power Laser Ablation, 1998, Santa Fe, NM, United States

Abstract

The novel technique of ultrafast pulsed laser deposition has been experimentally demonstrated by depositing high quality diamond-like carbon films using high repetition rate Nd:YAG lasers. A very effective evaporation regime was achieved by keeping the laser intensity on the target surface close to the optimum values determined in Part 1 of this paper. Evaporation of the target by low energy laser pulses at an intensity of 10⁹ W/cm² allows the elimination of particles from the vapor and results in films with very high surface quality, while the very high repetition rate increases the overall deposition rate. Results are presented on the evaporation of carbon using either a 10 kHz, 120 ns Q-switched Nd:YAG laser, or a 76 MHz 60 ps mode-locked Nd:YAG laser. The number of particles visible in optical microscope on the DLC film deposited using the mode-locked laser was less than one particle per mm². SEM images demonstrated that the deposited film had a very fine surface texture of with nanoscale irregularities on the surface. AFM surface microroughness measurements revealed a saturation-like behavior of the RMS roughness at the level 12 nm over the whole deposited surface area for 10 kHz Q-switched laser evaporation and almost an atomic level (less than 1 nm) roughness for the 76 MHz mode-locked laser evaporation. Raman spectroscopy of the deposited films indicated that they were a mixture of sp³ and sp² bonded amorphous carbon. The thickness of the diamond-like carbon film deposited simultaneously on two 4 inch silicon wafers varied by only plus or minus 5% over an area of approximately 250 cm² and the deposition rate was approximately 2 - 6 angstrom/s at a distance of approximately 150 mm from the target.

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Andrei V. Rode, Barry Luther-Davies, and Eugene G. Gamaly "Ultrafast ablation with high-pulse-rate Nd:YAG lasers: II. Experiments on deposition of diamondlike carbon films", Proc. SPIE 3343, High-Power Laser Ablation, (14 September 1998); https://doi.org/10.1117/12.321555

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