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11 September 1998 Micromachined silicon deformable mirror
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Abstract
A new silicon deformable mirror design is presented which provides high reflectivity, an optical quality continuous surface, and high intensity handling capacity. Its features make it useful for a wide range of devices including telescopes, leasers, and photolithographic systems. The mirror architecture is similar to commercial electrostrictive deformable mirrors. A focus corrector built using this architecture exhibited 2.25 microns of actuation at the center through the application of 100v corresponding to a radius of curvature of -2.4m. A 30 micrometers thick 1cm diameter silicon mirrors exhibited its first mechanical resonance at 2.7kHz. A mirror coated with 100nm of gold was shown to be able to withstand 100kW/cm2 of continuous wave 1064nm intensity for 10 minutes without observable degradation. An active mode-matching experiment was performed showing that 99.5 percent of a Nd:YAG beam could be coupled to a finesse 4000 ring cavity.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Justin D. Mansell and Robert L. Byer "Micromachined silicon deformable mirror", Proc. SPIE 3353, Adaptive Optical System Technologies, (11 September 1998); https://doi.org/10.1117/12.321668
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