Paper
21 August 1998 Design for a near-infrared immersion echelle spectrograph: breaking the R=100,000 barrier from 1.5 to 5 μm
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Abstract
We have designed a near IR spectrograph, sensitive in the 1.5-5 micrometers range, that uses a silicon immersion echelle grating. The cross-dispersed design demonstrates that immersion echelles allow compact spectrographs which have excellent spectral coverage and very high resolving power. Our instrument will have continuous spectral coverage over a 5.7 percent passband at 2.3 micrometers or a 7.6 percent passband at 4.6 micrometers and resolving power ranging from R equals 87,000 at 4.6 micrometers to 109,000 at 2.3 micrometers . We discuss design issues that are unique to spectrographs using silicon immersion echelle gratings in the near IR such as grating parameters, geometry, and the mechanical and thermal properties of large pieces of single crystal silicon.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luke D. Keller, Daniel T. Jaffe, and Greg W. Doppmann "Design for a near-infrared immersion echelle spectrograph: breaking the R=100,000 barrier from 1.5 to 5 μm", Proc. SPIE 3354, Infrared Astronomical Instrumentation, (21 August 1998); https://doi.org/10.1117/12.317312
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Cited by 3 scholarly publications and 1 patent.
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KEYWORDS
Spectrographs

Silicon

Spectral resolution

Collimators

Near infrared

Optical design

Diffraction gratings

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