Ablation dynamic studies of polymers with a coherent VUV source at 125 nm

D. Riedel; M. C. Castex

doi:10.1117/12.308622

26 May 1998 Ablation dynamic studies of polymers with a coherent VUV source at 125 nm

D. Riedel, M. C. Castex

Proceedings Volume 3404, ALT'97 International Conference on Laser Surface Processing; (1998) https://doi.org/10.1117/12.308622
Event: ALT '97 International Conference on Laser Surface Processing, 1997, Limoges, France

Abstract

First demonstration is given here about the use of a VUV coherent source at 125 nm for efficient and clean etching of polytetrafluoroethylene PTFE and poly(methyl methacrylate) PMMA polymers. Measurements of etch rate as a function of fluence and number of shots are presented and compared with previous works using 157 nm (F₂ laser) and 193 nm (ArF laser). Experimental results are presented and physical approach is made with classical Beer-Lambert's absorption law and discussed.

Citation Download Citation

D. Riedel and M. C. Castex "Ablation dynamic studies of polymers with a coherent VUV source at 125 nm", Proc. SPIE 3404, ALT'97 International Conference on Laser Surface Processing, (26 May 1998); https://doi.org/10.1117/12.308622

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