Whole-field digital analysis of photoelastic fringe patterns

Terry Y. Chen

doi:10.1117/12.323301

29 September 1998 Whole-field digital analysis of photoelastic fringe patterns

Terry Y. Chen

Proceedings Volume 3407, International Conference on Applied Optical Metrology; (1998) https://doi.org/10.1117/12.323301
Event: International Conference on Applied Optical Metrology, 1998, Balatonfured, Hungary

Abstract

Digital approaches for fringe multiplication, determination of fringe order and principal stress direction in photoelasticity are presented. Relevant theories are described. The scheme developed allows for: (1) multiply the fringes to a factor of 16; (2) automatic determination of the fringe orders with or without zero-order fringes in the fringe patterns, (3) directly determining the principal stress angles in the range (pi) /2. Test results are reported.

Citation Download Citation

Terry Y. Chen "Whole-field digital analysis of photoelastic fringe patterns", Proc. SPIE 3407, International Conference on Applied Optical Metrology, (29 September 1998); https://doi.org/10.1117/12.323301

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