Paper
1 September 1998 Detection of 60° phase defects on alternating PSMs
Chris A. Spence, David Emery, Larry S. Zurbrick, Durai P. Prakash, X. Chang, Steve Khanna, Brent D. Leback, Eiji Tsujimoto, Greg P. Hughes, Baorui Yang
Author Affiliations +
Abstract
In this paper we present results of an algorithm that has been developed which is sensitive to phase defects of 60 degrees on i-line alternating PSMs. This algorithm consists of microcode and software, which can be loaded into existing inspection hardware. The algorithm works in die-to-die inspection mode and uses both transmitted and reflected light images to maximize sensitivity. Isolated phase defects as well as phase defects close to chrome edges were inspected. In addition, the algorithm is able to detect missing and mis-aligned shifter edges. A programmed phase defect test plate was developed to characterize defect detection sensitivity. Detection of 60 degrees defects smaller than 0.75 micrometers has been demonstrated with this algorithm. Defect sensitivity characterization and actual production plate effect results are shown. Finally, recent results showing the application of the algorithm to the inspection of Deep-UV multiphase reticles using a shorter inspection wavelength are presented.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chris A. Spence, David Emery, Larry S. Zurbrick, Durai P. Prakash, X. Chang, Steve Khanna, Brent D. Leback, Eiji Tsujimoto, Greg P. Hughes, and Baorui Yang "Detection of 60° phase defects on alternating PSMs", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328859
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KEYWORDS
Inspection

Reticles

Photomasks

Deep ultraviolet

Detection and tracking algorithms

Algorithm development

Defect detection

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