Toward 150-nm defect detection capability

Yair Eran; Gad Greenberg; Michael M. Har-Zvi

doi:10.1117/12.328837

1 September 1998 Toward 150-nm defect detection capability

Yair Eran, Gad Greenberg, Michael M. Har-Zvi

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328837
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

With the advance of photolithography technology into the super-resolution regime, reticle features are becoming denser and their dimensions are shrinking. This leads to much stricter design rules, which include a decrease in the dimensions of the critical defects needed to be detected. Orbot-Applied's new Improved Image Acquisition module has been developed as a means of meeting the rising demand in defect detection capability and integrated into RT-8000ES Die-to-Database reticle inspection system. The main purpose of this evaluation was to test the system's performance under difficult production conditions in its highest defect detection sensitivities.

Citation Download Citation

Yair Eran, Gad Greenberg, and Michael M. Har-Zvi "Toward 150-nm defect detection capability", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328837

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